Alumina Round Trays

Alumina Round Trays from LSP Industrial Ceramics are indispensable in industries requiring high-temperature stability and chemical resistance, withstanding temperatures up to 1750°C. In materials science, they are used for sintering and annealing advanced ceramics, composites, and nanomaterials, ensuring contamination-free results due to their high purity (99% to 99.7% alumina). The semiconductor industry utilizes these trays for wafer annealing and chemical vapor deposition (CVD) processes, where their inertness prevents contamination of sensitive components. Available in various diameters, heights, and capacities, these trays provide flexibility for applications like heat treatment in metallurgy, where they support the melting and assaying of refractory metals such as tungsten and platinum.

Beyond industrial applications, Alumina Round Trays are widely used in laboratory settings for thermal analysis and sample processing, such as in thermogravimetric analysis (TGA) and calcination experiments. Their resistance to acids, alkalis, and other corrosive substances makes them ideal for chemical synthesis in the pharmaceutical and chemical industries, ensuring reliable outcomes during processes like catalyst preparation. The trays’ durability and thermal shock resistance allow for repeated use in high-temperature furnaces, making them a cost-effective choice for academic research and industrial Research and Development. LSP Industrial Ceramics offers customizable options to meet specific needs, ensuring optimal performance across diverse high-stakes environments.