Alumina Round Trays

Alumina Round Tray
ITEM# RUD CAPACITY (ML) DIAMETER (mm) HEIGHT (mm)
RD001 1 16 8
RD0025 2.5 22 10
RD005 5 28 12
RD010 10 36 15
RD025 25 48 20
RD050 50 60 20
RD075 75 70 25
RD100 100 80 28
RD150 150 90 32
RD250 250 100 40
RD500 500 125 50
RD750 750 150 55
RD1000 1000 175 58
ITEM# RUD CAPACITY (ML) DIAMETER (mm) HEIGHT (mm)
WordPress Tables Plugin

Uses & Applications

Alumina Round Trays from LSP Industrial Ceramics are indispensable in industries requiring high-temperature stability and chemical resistance, withstanding temperatures up to 1750°C. In materials science, they are used for sintering and annealing advanced ceramics, composites, and nanomaterials, ensuring contamination-free results due to their high purity (99% to 99.7% alumina). The semiconductor industry utilizes these trays for wafer annealing and chemical vapor deposition (CVD) processes, where their inertness prevents contamination of sensitive components. Available in various diameters, heights, and capacities, these trays provide flexibility for applications like heat treatment in metallurgy, where they support the melting and assaying of refractory metals such as tungsten and platinum.

Beyond industrial applications, Alumina Round Trays are widely used in laboratory settings for thermal analysis and sample processing, such as in thermogravimetric analysis (TGA) and calcination experiments. Their resistance to acids, alkalis, and other corrosive substances makes them ideal for chemical synthesis in the pharmaceutical and chemical industries, ensuring reliable outcomes during processes like catalyst preparation. The trays’ durability and thermal shock resistance allow for repeated use in high-temperature furnaces, making them a cost-effective choice for academic research and industrial Research and Development. LSP Industrial Ceramics offers customizable options to meet specific needs, ensuring optimal performance across diverse high-stakes environments.

Precision Engineering for Uniform Heating

Alumina round trays are designed with consistent wall thickness and geometry to ensure even heat distribution. This precision is good for processes such as sintering, annealing, and calcination, where uniform thermal exposure directly impacts material quality.

Long-Term Reliability in Harsh Conditions

With resistance to acids, alkalis, and corrosive atmospheres, alumina trays maintain structural integrity under repeated use. Their thermal shock resistance allows them to endure rapid temperature changes without cracking, making them dependable for high temperature furnaces.

Flexible Capacities for Diverse Applications

Available in sizes ranging from 1 ml to 1000 ml, alumina round trays provide versatility for both small scale laboratory experiments and large volume industrial production. This adaptability ensures researchers and manufacturers can select the right tray for their specific needs.

Industry-Wide Trust and Customization

From semiconductor manufacturing to pharmaceutical synthesis, alumina round trays are trusted across industries where purity and durability are non negotiable. LSP Industrial Ceramics offers customizable options to meet specialized requirements, ensuring optimal performance in demanding environments.

FAQ

What Temperature Range Can Alumina Round Trays Handle?

They can withstand temperatures up to 1750°C, making them suitable for extreme heat applications.

Why Are Alumina Round Trays Preferred in Semiconductor Manufacturing?

Their chemical inertness prevents contamination during wafer annealing and CVD processes.

Can Alumina Round Trays Be Customized?

Yes. They are available in multiple sizes and can be tailored to specific industrial or laboratory requirements.

What Industries Commonly Use Alumina Round Trays?

Materials science, metallurgy, semiconductors, pharmaceuticals, and chemical processing rely on them for precision work.